Abstract:With the development of nanofilm deposition technology, the transient temperature measurement based on thin film thermocouple has been widely applied in various applications. To realize the application of thin film thermocouple in milling, a method for preparing high performance thin film thermocouple is proposed. NiCr/NiSi thin film thermocouple is prepared on a quartz substrate by DC pulse magnetron sputtering technology. It is annealed at different temperatures in an argon atmosphere. The influences of annealing on the comprehensive property of the thin film thermocouple are studied. Experimental results show that uniformity and conductivity of functional films annealed at 500℃ are improved significantly. The Seebeck coefficient of thin film thermocouple is increased from 363 μV/℃ before annealing to the maximum value of 405 μV/℃. The performance of temperature measurement remains stable after continuous thermal shock and high temperature insulation for 6 hours. The research result of highperformance thin film thermocouple is used in the development of temperature measurement milling cutter and TC4 orthogonal milling. The prediction formula of TC4 milling temperature is obtained. The proposed method provides a feasible solution for the temperature measurement of of rotary processing.